Wang Youqing, An Chengwu, Zhou Jianguang, Li Zaiguang. Application of high frequency preionization in high pressure pulse discharge[J]. LASER TECHNOLOGY, 1996, 20(4): 198-201.
Citation:
Wang Youqing, An Chengwu, Zhou Jianguang, Li Zaiguang. Application of high frequency preionization in high pressure pulse discharge[J]. LASER TECHNOLOGY, 1996, 20(4): 198-201.
Wang Youqing, An Chengwu, Zhou Jianguang, Li Zaiguang. Application of high frequency preionization in high pressure pulse discharge[J]. LASER TECHNOLOGY, 1996, 20(4): 198-201.
Citation:
Wang Youqing, An Chengwu, Zhou Jianguang, Li Zaiguang. Application of high frequency preionization in high pressure pulse discharge[J]. LASER TECHNOLOGY, 1996, 20(4): 198-201.
Application of high frequency preionization in high pressure pulse discharge
This paper introduces the theoretical and experimental study of high frequency preionization characters in high pressure discharge.Results show that the high frequency discharge can increase the input power density,if the initial electron density is over 1011/cm3,the requirement of the uniformity of the main discharge pulse can satisfied.
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