Research of the fabrication of micro channels in a fused silica substrate using laser-induced plasma

In order to fabricate high-quality micro channels in a fused silica,the fundamental frequency laser of a Qswitched Nd:YAG laser at 1064nm and the mixing laser composed of 70% second harmonic laser and 30% fundamental frequency laser were used to irradiate a fused silica substrate respectively to induce the plasma,by which micro channels in a fused silica substrate were fabricated.And the reasons for difference between two kinds of processing methods were analyzed.The results show that the interior wall of the channels processed by mixing laser are smoother and its drilling rate is faster than that processed by fundamental frequency.Furthermore,the depth of the channels processed by the mixing laser is up to 8mm.