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MIAO Xin-xiang, YUAN Xiao-dong, CHENG Xiao-feng, HE Shao-bo, ZHENG Wan-guo. Thermal stress simulation of laser induced damage of fused silica by contamination on the surface[J]. LASER TECHNOLOGY, 2011, 35(2): 285-288. DOI: 10.3969/j.issn.1001-3806.2011.02.039
Citation: MIAO Xin-xiang, YUAN Xiao-dong, CHENG Xiao-feng, HE Shao-bo, ZHENG Wan-guo. Thermal stress simulation of laser induced damage of fused silica by contamination on the surface[J]. LASER TECHNOLOGY, 2011, 35(2): 285-288. DOI: 10.3969/j.issn.1001-3806.2011.02.039

Thermal stress simulation of laser induced damage of fused silica by contamination on the surface

  • In order to study the laser-induced damage mechanism in inertial confinement fusion system,temperature and thermal stress distributions in the fused silica,heated by repetition frequency laser,were given by means of finite element methods.The simulated results indicate the temperature of the contaminations rise to 2800K during the pulse laser irradiation, but the fused silica's temperature mainly rise from 300K to 2200K in 100μs after irradiation,and damage induced by the thermal stress occurs.The strong compressive in the damage region is about 30.73MPa.The highest stress outside the damage region is deviatoric hoop stress.The damage morphologies were tested by means of optical microscopy.The simulated outcomes correspond to the experiment result.
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