Extended application of wide spectrum Mueller matrix ellipsometry

FANG Huiwen; YANG Jinhong; ZHANG Meijuan; HE Shengnan; WANG Weihua

doi:10.7510/jgjs.issn.1001-3806.2024.01.012

LASER TECHNOLOGY > 2024 > 48(1): 71-76. > DOI: 10.7510/jgjs.issn.1001-3806.2024.01.012

FANG Huiwen, YANG Jinhong, ZHANG Meijuan, HE Shengnan, WANG Weihua. Extended application of wide spectrum Mueller matrix ellipsometry[J]. LASER TECHNOLOGY, 2024, 48(1): 71-76. DOI: 10.7510/jgjs.issn.1001-3806.2024.01.012

Citation:

PDF (9306 KB)

Extended application of wide spectrum Mueller matrix ellipsometry

Institute of Material Science and Information Technology, Anhui University, Hefei 230601, China

More Information

Received Date: December 06, 2022
Revised Date: February 23, 2023
Published Date: January 24, 2024

Graphical Abstract

Abstract

Abstract

In order to overcome the deficiency that the measurement function of the existing spectral Mueller matrix ellipsometer had been fixed and could not measure more physical quantities according to the experimental requirements, a new scheme was proposed to measure more physical parameters by combining multi-physical field optical simulation and wide-spectrum Mueller matrix ellipsometry measurement data. Taking film thickness measurement as an example, by comparing the matching degree of Mueller matrix obtained by the measured values of an ellipsometer and the simulated values of silicon dioxide films with different thicknesses and at different incident angles on a silicon substrate, the thickness value of the silica film with the smallest relative mean square error was obtained. The results show that the thickness of the film is in good agreement with the measured values. This study validates the feasibility and effectiveness of the combined method of spectral Muller matrix ellipsometry measurement and simulation.
- geometrical optics,
- ellipsometry,
- simulation,
- Mueller matrix

FullText(HTML)

References (19)

References

[1]	吴曼玉, 黄水平. Zr基薄膜金属玻璃的制备及其光学常数测定[J]. 光子学报, 2020, 49(10): 1031001. WU M Y, HUANG Sh P. Preparation of Zr-based thin-film metallic glass and determination of optical constants [J]. Acta Photonica Sinica, 2020, 49(10): 1031001(in Chinese).
[2]	LI J, HWU J J, LIU Y, et al. Mueller matrix measurement of asymmetric gratings[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2010, 9(4): 041305. DOI: 10.1117/1.3514708
[3]	CHEN X, ZHANG C, LIU S, et al. Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures[J]. Journal of Applied Physics, 2014, 116(19): 194305. DOI: 10.1063/1.4902154
[4]	KU S, MAHATO K K, MAZUMDER N. Polarization-resolved Stokes-Mueller imaging: A review of technology and applications[J]. Lasers in Medical Science, 2019, 34(7): 1283-1293. DOI: 10.1007/s10103-019-02752-1
[5]	NOVIKOVA T, de MARTINO A, OSSIKOVSKI R, et al. Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics[J]. The European Physical Journal-Applied Physics, 2005, 31(1): 63-69. DOI: 10.1051/epjap:2005034
[6]	陈修国, 刘世元, 张传维, 等. 基于Mueller矩阵椭偏仪的纳米压印模板与光刻胶光栅结构准确测量[J]. 物理学报, 2014, 63(18): 180701. CHEN X G, LIU Sh Y, ZHANG Ch W, et al. Accurate measurement of nanoimprint template and photoresist grating structure based on Mueller matrix ellipsometer [J]. Acta Physica Sinica, 2014, 63(18): 180701(in Chinese).
[7]	陈超. 高分辨层析成像穆勒矩阵椭偏仪研制与应用研究[D]. 武汉: 华中科技大学, 2021: 11-14. CHEN Ch. Research on the development and application of high-resolution tomography Mueller matrix ellipsometer [D]. Wuhan: Huazhong University of Science and Technology, 2021: 11-14(in Chinese).
[8]	郑州, 侯俊峰. 单波长中红外穆勒矩阵椭偏仪的设计、定标与测试[J]. 光学学报, 2022, 42(18): 1812004. ZHENG Zh, HOU J F. Design, calibration and test of single-wavelength mid-infrared Mueller matrix ellipsometer [J]. Journal of Optics, 2022, 42 (18): 1812004(in Chinese).
[9]	李伟奇. 高精度宽光谱穆勒矩阵椭偏仪研制与应用研究[D]. 武汉: 华中科技大学, 2016: 10-12. LI W Q. Research on the development and application of high-precision wide-spectrum Mueller matrix ellipsometer [D]. Wuhan: Huazhong University of Science and Technology, 2016: 10-12(in Chinese).
[10]	FUJIWARA H. Spectroscopic ellipsometry principles and applications[M]. New York, USA: John Wiley & Sons Inc., 2007: 23-25.
[11]	石玉君. 超导薄膜正常态下光电性质的椭偏研究[D]. 济南: 山东大学, 2020: 44-45. SHI Y J. Ellipsometry study on photoelectric properties of superconducting thin films in normal state [D]. Ji'nan: Shandong University, 2020: 44-45(in Chinese).
[12]	AZZAM R M A, BASHARA N M. Ellipsometry and polarized light [M]. Beijing: Science Press, 1986: 103-113.
[13]	GARCIA-CAUREL E, de MARTINO A, GASTON J P, et al. Application of spectroscopic ellipsometry and Mueller ellipsometry to optical characterization[J]. Applied Spectroscopy, 2013, 67(1): 1-21. DOI: 10.1366/12-06883
[14]	ZHAO Y, LI Y, HE W, et al. Polarization scattering imaging experiment based on Mueller matrix[J]. Optics Communications, 2021, 490: 126892. DOI: 10.1016/j.optcom.2021.126892
[15]	OSSIKOVSKI R, BUGAMI B A L, GARCIA-CAUREL E, et al. Polarizer calibration method for Mueller matrix polarimeters[J]. Applied Optics, 2020, 59(33): 10389-10395. DOI: 10.1364/AO.409799
[16]	YADAV H N S, KUMAR M, KUMAR A, et al. COMSOL simulation of microwave plasma polishing on different surfaces[J]. Materials Today, 2021, 45: 4803-4809.
[17]	CHEN C, AN I, FERREIRA G M. Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle [J]. Thin Solid Films, 2004, 455(1): 14-23.
[18]	FENG R, QIU J, CAO Y Y. Omnidirectional and polarization insensitive nearly perfect absorber in one dimensional meta-structure[J]. Applied Physics Letters, 2014, 105(18): 207402.
[19]	MIAO Z, TANG Y, WEI K, et al. Random error analysis of normalized Fourier coefficient in dual-rotating compensator Mueller matrix ellipsometer[J]. Measurement Science and Technology, 2021, 32(12): 125602. DOI: 10.1088/1361-6501/ac1a80

Cited By

Cited by

Periodical cited type(0)

Other cited types(3)

Get Citation

PDF

XML

Article views (4) PDF downloads (8) Cited by(3)

Turn off MathJax

Article Contents

Abstract

References

Extended application of wide spectrum Mueller matrix ellipsometry

Abstract

References

Cited by

Periodical cited type(0)

Other cited types(3)

Catalog

Links：

Extended application of wide spectrum Mueller matrix ellipsometry

Abstract

References

Cited by

Periodical cited type(0)

Other cited types(3)

Catalog

Links：

Export File

Citation

Format

Content