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Volume 34 Issue 1
May  2010
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Self-deflection of matching Gaussian beam in two-photon photorefractive media

  • Received Date: 2008-11-18
    Accepted Date: 2009-02-17
  • In order to study the dynamic evolution and self-deflection of matching Gaussian beam in two-photon photorefractive media in external electric field, numerical simulation was used to obtain the dynamic evolution process and self-deflection graphics. The obtained results indicate that matching Gaussian beam can evolve into steady-state solitary wave for a given two-photon photorefractive crystal and the diffusion effect can cause self-deflection for the matching Gaussian beam. At first, the degree of self-deflection of matching Gaussian beam increases with the external electric field, however it decreases with the external electric field after a certain point. The relation between the degree of self-deflection of matching Gauss beam and the intensity of incident light is similar to external electric field.
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Self-deflection of matching Gaussian beam in two-photon photorefractive media

  • 1. Department of Physics and Electronics Engineering, Yuncheng University, Yuncheng 044000, China

Abstract: In order to study the dynamic evolution and self-deflection of matching Gaussian beam in two-photon photorefractive media in external electric field, numerical simulation was used to obtain the dynamic evolution process and self-deflection graphics. The obtained results indicate that matching Gaussian beam can evolve into steady-state solitary wave for a given two-photon photorefractive crystal and the diffusion effect can cause self-deflection for the matching Gaussian beam. At first, the degree of self-deflection of matching Gaussian beam increases with the external electric field, however it decreases with the external electric field after a certain point. The relation between the degree of self-deflection of matching Gauss beam and the intensity of incident light is similar to external electric field.

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