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JIANG Qi-chang, JI Xuan-mang, SU Yan-li, XIE Shi-jie. Self-deflection of matching Gaussian beam in two-photon photorefractive media[J]. LASER TECHNOLOGY, 2010, 34(1): 78-80. DOI: 10.3969/j.issn.1001-3806.2010.01.022
Citation: JIANG Qi-chang, JI Xuan-mang, SU Yan-li, XIE Shi-jie. Self-deflection of matching Gaussian beam in two-photon photorefractive media[J]. LASER TECHNOLOGY, 2010, 34(1): 78-80. DOI: 10.3969/j.issn.1001-3806.2010.01.022
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Self-deflection of matching Gaussian beam in two-photon photorefractive media

  • Department of Physics and Electronics Engineering, Yuncheng University, Yuncheng 044000, China

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  • Received Date: November 17, 2008
  • Revised Date: February 16, 2009
  • Published Date: January 24, 2010
    Graphical Abstract
    • Abstract
  • In order to study the dynamic evolution and self-deflection of matching Gaussian beam in two-photon photorefractive media in external electric field, numerical simulation was used to obtain the dynamic evolution process and self-deflection graphics. The obtained results indicate that matching Gaussian beam can evolve into steady-state solitary wave for a given two-photon photorefractive crystal and the diffusion effect can cause self-deflection for the matching Gaussian beam. At first, the degree of self-deflection of matching Gaussian beam increases with the external electric field, however it decreases with the external electric field after a certain point. The relation between the degree of self-deflection of matching Gauss beam and the intensity of incident light is similar to external electric field.
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    • References (12)
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