Wavefront distortion measurement in high power ultra-short pulse Ti：sapphire laser system

LIU Lan-qin; ZHU Qi-hua; ZHOU Kai-nan; WANG Xiao-dong; HUANG Xiao-jun; PENG Han-sheng; KUDRYASHOV A V; ZAVALOVA V

To characterize beam quality in high power SILEX-Ⅰ ultra-short pulse Ti:sapphire laser system,experiments on wavefront measurement are performed.Using Shack-Hartmann wavefront sensor manufactured by Institute of Laser and Information Technology of the Russian Academy of Science,experiments at different positions are completed.The results show that the beam quality of this facility is very good,the P-V is 0.13λ,the RMS is 0.02λ before the compressor,and the P-V is 0.63λ,the RMS is 0.09λ after the compressor.The experimental results show that the system has good beam quality,and the wavefront aberration mainly come from the compressor.

1. Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China;

2. Institute on Laser and Information Technology, the Russian Academy of Science, Moscow 140700, Russia

Received Date: 2005-11-18

Accepted Date: 2006-01-20

Available Online: 2007-02-25

Abstract: To characterize beam quality in high power SILEX-Ⅰ ultra-short pulse Ti:sapphire laser system,experiments on wavefront measurement are performed.Using Shack-Hartmann wavefront sensor manufactured by Institute of Laser and Information Technology of the Russian Academy of Science,experiments at different positions are completed.The results show that the beam quality of this facility is very good,the P-V is 0.13λ,the RMS is 0.02λ before the compressor,and the P-V is 0.63λ,the RMS is 0.09λ after the compressor.The experimental results show that the system has good beam quality,and the wavefront aberration mainly come from the compressor.

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Reference (9)

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Wavefront distortion measurement in high power ultra-short pulse Ti：sapphire laser system

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