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ZHOU Wei-jun, YUAN Yong-hua, GUI Yuan-zhen. Simple time measurement of TiO2/SiO2 film damaged by laser[J]. LASER TECHNOLOGY, 2007, 31(4): 381-383.
Citation: ZHOU Wei-jun, YUAN Yong-hua, GUI Yuan-zhen. Simple time measurement of TiO2/SiO2 film damaged by laser[J]. LASER TECHNOLOGY, 2007, 31(4): 381-383.
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Simple time measurement of TiO2/SiO2 film damaged by laser

  • Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900, China

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  • Received Date: May 28, 2006
  • Revised Date: July 09, 2006
  • Published Date: August 24, 2007
    Graphical Abstract
    • Abstract
  • A simple method was used to study the initiative time of the thin film irradiated by laser,in which adopting 1.06μm,1.315μm CW laser and 1.06μm single pulse to irradiate typical optical film elements,laser reflex from the surfaces of film elements was measured reflected signal happened to change in a certain time,which is in accordance with time of film damaged by laser.The damaged time was 0.8s and 0.4s when 1.06μm CW laser density was 7133W/cm2 and 11776W/cm2 respectively.The damage time was 3.63ns,2.727ns and 1.09ns when 1.06μm single pulse laser energy was 48.725mJ,97.45mJ,194.9mJ respectively.The damaged time was 3.44s and 1.44s when 1.315μm CW laser density was 2743W/cm2and 4128W/cm2 respectively.Result shows the method of measuring reflected signal of damaged thin films can obtain damaged time of film and it is hepful for improving the laser-resistance of film.
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    • References (10)
  • [1]
    GAO Zh Y,GAO Y,ZHANG K H.Military photo electricity system[M].Beijing:Beijing Institute of Science and Technology Press,1996,7:1～20(in Chinese).
    [1]
    ZHOU W J,YUAN Y H,GUI Y Zh et al.Research on damage of TiO2/SiO2 film induced-by 1.06μm CW laser[J].Laser Technology,2006,30(1):77～81(in Chinese).
    [2]
    LI Zh Y,DENG H,FAN Zh X.1.06μm laser-jinduced of Ti,Zr thin-film optical coating[J].Chinese Journal of Laser,1988,16(7):413～416(in Chinese).
    [3]
    XIA J J,LI Zh Y,CHENG L.532nm laser induced damage to optical film[J].Laser Technology,1996,20(3):378～379(in Chinese).
    [4]
    ZHOU W J,YUAN Y H,GUI Y Zh.Thermal effect of TiO2/SiO2/K9 film by 1.06μm CW laser[J].High Power Laser and Particle Beams,2006,17(9):1308～1311(in Chinese).
    [5]
    MASUD M,NEVILLE C G A,GOODMAN J W.Laser-induced local heating of multilayer[J].Appl Opt,1982,21(6):1107～1114.
    [6]
    ZHAO Q,FAN Zh X,WANG Zh J.Digital analysis of laser induced thermal process in optical coatings[J].Acta Optical Sinica,1999,19(8):1020～1023(in Chinese).
    [7]
    COHEN S S,BERMSTEIN J B,WYATT P W et al.The effect of mul-tiple laser pulses on damage to thin metallic films[J].Appl Phys,1992,71(2):630～637.
    [8]
    QIANG X W,ZHANG J Q,LIU F et al.Thermal stress damage of sem-iconductors induced by laser beam[J].Chinese Journal of Lasers,2000,27(8):710～713(in Chinese).
    [9]
    GONG H,LI Ch F,CUI J W et al.Optical damage study of materials with high repetitive laser pulse irradiation[J].Acta Optical Sinica,1996,16(2):229～231(in Chinese).
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