Laser chemical vapor deposition used in photomask repair

HUANG He; ZHU Xiao; ZHU Chang-hong; ZHU Guang-zhi; LI Yue-song; ZHANG Pei; WAN Cheng-hua

In order to repair the clear defects of photomask,a 355nm UV laser with the intensity of 1.3×108W/cm2 is used to induce hexacarbonyls chrome photolysis in the open air,and get the Cr film with good adhesion and extinction on transparent substrate.Results show that,in the open air,the method with high intensity and short radiation time can get high quality film.

Corresponding author: ZHU Xiao, zx@hust.edu.cn;

1. Institute of Laser Technology and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China;

2. Qingyi Precision Maskmaking LTD., Shenzhen 518000, China

Received Date: 2006-03-06

Accepted Date: 2006-09-29

Available Online: 2007-06-25

Abstract: In order to repair the clear defects of photomask,a 355nm UV laser with the intensity of 1.3×108W/cm2 is used to induce hexacarbonyls chrome photolysis in the open air,and get the Cr film with good adhesion and extinction on transparent substrate.Results show that,in the open air,the method with high intensity and short radiation time can get high quality film.

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Reference (10)

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Laser chemical vapor deposition used in photomask repair

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References

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