Laser chemical vapor deposition used in photomask repair

In order to repair the clear defects of photomask,a 355nm UV laser with the intensity of 1.3×108W/cm2 is used to induce hexacarbonyls chrome photolysis in the open air,and get the Cr film with good adhesion and extinction on transparent substrate.Results show that,in the open air,the method with high intensity and short radiation time can get high quality film.