Study on error diffusion algorithm of binary encode grating
-
Corresponding author:
SU Xian-yu, xysu@email.scu.edu.cn
-
Received Date:
2006-03-22
Accepted Date:
2006-06-05
-
Abstract
In order to study binary error diffusion algorithm,computer simulation is used to form grating templates which are used in the phase measuring profilometry.The influence of error distributing coefficients and the number of error diffusion points on the precision of encoding and phase measurement is discussed.The results indicate that with the three familiar kinds of error distributing coefficients,the three corresponding sinusoidal structured illumination formed all have relatively high measurement precision and there isn't obvious diversity among them.The influence of diffusion points number on the precision of encoding and phase measurement is relatively small.According to the experiment,the general error of the system can be controlled within 1% of the equivalent wavelength.As a result,the feasibility and accuracy of binary error diffusion method are proved.
-
-
References
[1]
|
SRINIVASAN V,LIU H C,HALIOUA M.Automated phase-measuring profilometry of 3-D diffuse objects[J].Appl Opt,1984,23(18):3105~3108. |
[2]
|
SU X Y,von BALLY G,VUKICEVIC D.Phase-stepping grating profilometry utilization of intensity modulation analysis in complex objects evaluation[J].Opt Commun,1993,98:141~150. |
[3]
|
JUDGE T R,BRYANSTON-CROSS P J.A review of phase unwrapping techniques in fringe analysis[J].Optical and Lasers in Engineering,1994,21(4):199~239. |
[4]
|
SU X Y.Phase unwrapping techniques for 3-D shape measurement[J].Proc SPIE,1996,2866:465~465. |
[5]
|
SU X Y,ZHOU W Sh.Phase measuring profilometry with defocusing illumination Ronchi grating[J].Opto-electronic Engineering,1993,20(4):8~16(in Chinese). |
[6]
|
XIAN T,SU X Y.Area modulation grating for sinusoidal structure illumination on phase-measuring profilometry[J].Appl Opt,1999,40(8):1153~1158. |
[7]
|
BRYNDAHL O,SCHEERMESSER T,WYROWSKI F.Digital halftoning:synthesis of binary images[J].Progress in Optics,1994,33(1):389~462. |
[8]
|
TAN X S,SU X Y.Characteristics of the three dimensional distribution of talbot diffraction field[J].Opto-electronic Engineering,1996,23(2):35~42(in Chinese). |
[9]
|
CHENG Y L,LI S N,WANG Q.Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J].Laser Technology,2004,28(6):2~5(in Chinese). |
[10]
|
SONG D Y.Research status of deep ultraviolet lithography with 193nm excimer laser[J].Laser Technology,1999,23(5):34~37(in Chinese). |
-
-
Proportional views
-