Study on temperature and stress field of film-substrate system irradiated by laser scratching

FENG Ai-xin; CHENG Chang; YIN Su-min; ZHOU Jian-zhong; TANG Cui-ping

The temperature and stresses distributions on film systems were simulated.A steady-state analysis of the temperature field and stress field of TiN film irradiated by a moving Gaussian laser was made with finite element analysis program.As a result,the temperature field is moving along with the lamp house,the largest temperature of temperature field is in the center of laser facula,and there is an obvious sluggish phenomenon in the backside temperature field of laser facula moving way.The stress field of film-substrate mainly concentrates in the film.The study of temperature and stress field is important for the research of film shape deformation.

1. School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, China

Received Date: 2007-07-18

Accepted Date: 2007-08-07

Available Online: 2008-10-25

Abstract: The temperature and stresses distributions on film systems were simulated.A steady-state analysis of the temperature field and stress field of TiN film irradiated by a moving Gaussian laser was made with finite element analysis program.As a result,the temperature field is moving along with the lamp house,the largest temperature of temperature field is in the center of laser facula,and there is an obvious sluggish phenomenon in the backside temperature field of laser facula moving way.The stress field of film-substrate mainly concentrates in the film.The study of temperature and stress field is important for the research of film shape deformation.

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Reference (10)

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Study on temperature and stress field of film-substrate system irradiated by laser scratching

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