Penning ionization of K in high-current-density discharge

Wang Qi; Zhao Li; Zhu Ruiyi; Ma Zuguang

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ISSN 1001-3806 CN 51-1125/TN Map

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Volume 19 Issue 3

Dec. 2013

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Article Navigation > LASER TECHNOLOGY > 1995 > 19(3): 174-178

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Penning ionization of K in high-current-density discharge

1.
Institute of Opto-Electronics, Harbin Institute of Technology

Abstract

A high-current-density,fast pulse discharge device has been developed,The device is used to excite He/K mixed vapor,and the Penning ionization of K byHe(6d￣3D),HeB(5s￣1S)and He(4p￣1P_0)is observed in discharge afterflow.
- high-current density,
- quick pulsed discharge,
- He/K vapour,
- Pen-ning ionization
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通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

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Penning ionization of K in high-current-density discharge

1. Institute of Opto-Electronics, Harbin Institute of Technology

Available Online: 1995-05-25

Abstract: A high-current-density,fast pulse discharge device has been developed,The device is used to excite He/K mixed vapor,and the Penning ionization of K byHe(6d￣3D),HeB(5s￣1S)and He(4p￣1P_0)is observed in discharge afterflow.

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Penning ionization of K in high-current-density discharge

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通讯作者: 陈斌, bchen63@163.com

Proportional views

Penning ionization of K in high-current-density discharge

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