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Wang Qi, Zhao Li, Zhu Ruiyi, Ma Zuguang. Penning ionization of K in high-current-density discharge[J]. LASER TECHNOLOGY, 1995, 19(3): 174-178.
Citation: Wang Qi, Zhao Li, Zhu Ruiyi, Ma Zuguang. Penning ionization of K in high-current-density discharge[J]. LASER TECHNOLOGY, 1995, 19(3): 174-178.
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Penning ionization of K in high-current-density discharge

  • Institute of Opto-Electronics, Harbin Institute of Technology

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  • Published Date: May 24, 1995
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  • A high-current-density,fast pulse discharge device has been developed,The device is used to excite He/K mixed vapor,and the Penning ionization of K byHe(6d￣3D),HeB(5s￣1S)and He(4p￣1P_0)is observed in discharge afterflow.
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