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YE Zhen-huan, LOU Qi-hong, LI Hong-xia, DONG Jing-xing, WEI Yun-rong. Beam homogenizing technology for UV excimer laser[J]. LASER TECHNOLOGY, 2005, 29(2): 207-209,212.
Citation: YE Zhen-huan, LOU Qi-hong, LI Hong-xia, DONG Jing-xing, WEI Yun-rong. Beam homogenizing technology for UV excimer laser[J]. LASER TECHNOLOGY, 2005, 29(2): 207-209,212.
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Beam homogenizing technology for UV excimer laser

  • 1.

    Shanghai Institute of Optics & Fine Mechanics, the Chinese Academy of Sciences, Shanghai 201800, China;

  • 2.

    School of Graduate, the Chinese Academy of Sciences, Beijing 100039, China

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  • Received Date: February 08, 2004
  • Revised Date: April 14, 2004
  • Published Date: March 24, 2005
    Graphical Abstract
    • Abstract
  • Limited by characteristic discharging structure and oscillating cavity,the beam energy profile of the excimer laser appears asymmetrically.The principles of various types of beam homogenizer,as well as specifications scaling the beam uniformity are presented.The pro-and-cons of these different technologies and their different valid applications are also discussed.
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    • References (6)
  • [1]
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    [2]
    DONG J X,YE Zh H,GAO H Y et al.Improvement of the intensity of excimer laser[J].Chinese J Lasers,1995,A22(12):894～896.
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    GAO H Y,LOU Q H,DONG J X et al.Beam homogenizer for XeCl laser and its applications[J].Atca Optica Sinica,1996,16(1):1379～1382.
    [4]
    LI H X,LOU Q H,DONG J X et al.A Noval homogenizer to improve the excimer laser beam uniformity[J].Chinese J Lasers,2004,31(7):785～788.
    [5]
    LI Ch D,CHEN T,ZUO T Ch et al.Design of fly's eye homogenizer for Excimer laser micromachining[J].Chinese J Lasers,1999,A26(6):560～564.
    [6]
    KLAUMINZER G,ABELE C.Excimer lasers need specifications forbeam uniformity[J].Laser Focus World,1991,27(5):153～158.
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