CHENG Yuan-li, LI Si-ning, WANG Qi. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. LASER TECHNOLOGY, 2004, 28(6): 561-564.
Citation:
CHENG Yuan-li, LI Si-ning, WANG Qi. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. LASER TECHNOLOGY, 2004, 28(6): 561-564.
CHENG Yuan-li, LI Si-ning, WANG Qi. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. LASER TECHNOLOGY, 2004, 28(6): 561-564.
Citation:
CHENG Yuan-li, LI Si-ning, WANG Qi. Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma[J]. LASER TECHNOLOGY, 2004, 28(6): 561-564.
Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma
The present status of extreme ultraviolet(EUV) source based on laser induced plasma(LIP) and discharge induced plasma(DIP) is reviewed.The characteristics and the progresses of LIP and DIP are compared.In general, discharge induced pinch plasma is of special interest,for its cost is expected to be much lower than that of LIP.
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