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Volume 28 Issue 5
Sep.  2013
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Article Navigation >  LASER TECHNOLOGY  > 2004 >  28(5): 547-549

Citation:
shu

A new method for AR coating in mass production of traveling wave SOA

  • 1.

    Key Laboratory of Optoelectronics Device and Systems of Guangdong Province, Institute of Optoelectronics, Shenzhen University, Shenzhen 518060, China;

  • 2.

    Department of Optoelectronics, HUST, Wuhan 430074, China

  • Received Date: 2003-08-11
    Accepted Date: 2003-11-04
  • A new monitor and control method for AR coating in mass production of traveling wave semiconductor optical amplifier(SOA) has been presented. With simplicity in system and operation, this technology can be applied to coating equipment made inland. Approximately as low as 10-4 of residual reflectivity in mass production with uniformity and repetition has been demonstrated.
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  • [1] 黄德修.半导体光电子学[M].成都:电子科技大学出版社,1994.90.[2] 黄菊仙.TWSLA AR膜剩余反射率实时监控新方法[J].激光技术,1992,16(2):76～80.[3] KAMINOW I,EISENSTEIN G,STULZ L.Measurement of the modal reflectivity of an antireflection coating on a superluminecent diode[J].IEEE J Q E,1983,19:493～495.
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通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

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A new method for AR coating in mass production of traveling wave SOA

  • 1. Key Laboratory of Optoelectronics Device and Systems of Guangdong Province, Institute of Optoelectronics, Shenzhen University, Shenzhen 518060, China;
  • 2. Department of Optoelectronics, HUST, Wuhan 430074, China
  • Received Date: 2003-08-11
  • Accepted Date: 2003-11-04
  • Available Online: 2004-09-25

Abstract: A new monitor and control method for AR coating in mass production of traveling wave semiconductor optical amplifier(SOA) has been presented. With simplicity in system and operation, this technology can be applied to coating equipment made inland. Approximately as low as 10-4 of residual reflectivity in mass production with uniformity and repetition has been demonstrated.

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