HU Shao-liu, JIANG Chao, HE Jian-ping, WANG You-qing. Study on the Al/Ag doping functional gradient thin films deposited by pulsed excimer laser[J]. LASER TECHNOLOGY, 2004, 28(5): 463-465,468.
Citation:
HU Shao-liu, JIANG Chao, HE Jian-ping, WANG You-qing. Study on the Al/Ag doping functional gradient thin films deposited by pulsed excimer laser[J]. LASER TECHNOLOGY, 2004, 28(5): 463-465,468.
HU Shao-liu, JIANG Chao, HE Jian-ping, WANG You-qing. Study on the Al/Ag doping functional gradient thin films deposited by pulsed excimer laser[J]. LASER TECHNOLOGY, 2004, 28(5): 463-465,468.
Citation:
HU Shao-liu, JIANG Chao, HE Jian-ping, WANG You-qing. Study on the Al/Ag doping functional gradient thin films deposited by pulsed excimer laser[J]. LASER TECHNOLOGY, 2004, 28(5): 463-465,468.
Metal gradient thin films have many excellent properties and a wide use.The aim of our research is to find new method and new techniques of preparing metal gradient thin films.Al/Ag doping functional gradient thin films have been successful synthesized on Si (100) substrate by using scanning pulsed excimer laser ablation technique.The structure of Al/Ag thin films deposited by pulsed laser deposition(PLD) is analyzed by scanning electron microscope(SEM),X-ray photoelectron spectroscopy(XPS).The experimental results illustrate that applying appropriate laser parameter and assistant discharge can synthesize the Al/Ag thin films with approximate ratio 5:1 at the 300℃.This experimental method indicates that it is feasible to deposit functional gradient metal thin films by means of the interaction between pulsed laser and metal doping target.
戢明,宋全胜,曾晓雁.脉冲激光沉积(PLD)薄膜技术的研究现状与展望[J].真空科学与技术,2003,23(1):22～26.[2] 刘晶儒,白婷.脉冲准分子激光淀积薄膜的实验研究[J].强激光与粒子束,2002,14(5):646～650.[3] ONG C K,XU S Y,ZHOU W Z et al.A novel approach for doping impurity in thin film in situ by dual-beam pulsed laser deposition[J].Review of Scientific Instruments,1998,69(10):3659～3661.[4] ZHOU W Z,CHUA D H C,XU S Y et al.The distribution of Ag in Ag-doped YBa2Cu3O7-δ thin film prepared by dual-beam pulsed-laser deposition[J].Supercond Sci Technol,1999,12(6):388～393.
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