Dynamic model of a new XeCl laser with short duration time and UV grow discharge system design

A new high power,short duration time XeCl laser is realized in order to prepare microstructure of quantum effect,depositing film,molecular beam epitaxy and analysis of output pulse profiles. It adopts the method of glow discharged,the calculation of dynamic equation,the analysis velocity reaction and density of XeCl laser,and UV preionization. In the addition,the parameters of the laser are also measured. The results are wavelength 308nm,the pulse duration time 18ns,the pulse energy 450mJ and the beam divergence angle 3mrad. It is shown that the proposed glow discharged is realized,the dynamic equation model of laser is correct,and the laser has high efficiency to produce the vapor plasma plume.It can be applied in the interaction between laser and material,material plasma study.