Advanced Search

ISSN 1001-3806 CN 51-1125/TN Map

Volume 28 Issue 4
Sep.  2013
Article Contents
Turn off MathJax
Article Navigation >  LASER TECHNOLOGY  > 2004 >  28(4): 434-437,448

Citation:
shu

Dynamic model of a new XeCl laser with short duration time and UV grow discharge system design

  • 1.

    Department of Physics, Xi'an Jiaotong University, Xi'an 710049, China;

  • 2.

    Department of Applied Physics, Northwes-tern Polytechnical University, Xi'an 710072, China;

  • 3.

    Department of Information & Communication, Xi'an Jiaotong University, Xi'an 710049, China

  • Received Date: 2003-08-27
    Accepted Date: 2004-02-04
  • A new high power,short duration time XeCl laser is realized in order to prepare microstructure of quantum effect,depositing film,molecular beam epitaxy and analysis of output pulse profiles. It adopts the method of glow discharged,the calculation of dynamic equation,the analysis velocity reaction and density of XeCl laser,and UV preionization. In the addition,the parameters of the laser are also measured. The results are wavelength 308nm,the pulse duration time 18ns,the pulse energy 450mJ and the beam divergence angle 3mrad. It is shown that the proposed glow discharged is realized,the dynamic equation model of laser is correct,and the laser has high efficiency to produce the vapor plasma plume.It can be applied in the interaction between laser and material,material plasma study.
  • 加载中
  • [1]

    MARTINO M,LUCHES A,FERNANDEZ M.Characterization of thin indium tin oxide films deposited by pulsed XeCl laser ablation [J].Appl Phys,2001,34 (17):2606～2609.
    [2]

    SKAKUN V S,LOMAEV M I,TARASENKO V F.KrCl and XeCl exciplex glow discharge lamps with an output power of similar to 1.5kW [J].Tech Phys Lett,2002,28(11):899～801.
    [3]

    BERRY G A.On the long pulse operation of an X-ray preionzed gas discharge pumped ArF excimer laser [J].A P L,1999,75:23～24.
    [4]

    ITO S.Continuous operation up to 3kHz in a discharge-pumped XeCl excimer laser [J].Appl Phys,1996,63(1):1～7.
  • 加载中
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索
Get Citation
PDF
XML

Article views(3446) PDF downloads(601) Cited by()

Proportional views

Dynamic model of a new XeCl laser with short duration time and UV grow discharge system design

  • 1. Department of Physics, Xi'an Jiaotong University, Xi'an 710049, China;
  • 2. Department of Applied Physics, Northwes-tern Polytechnical University, Xi'an 710072, China;
  • 3. Department of Information & Communication, Xi'an Jiaotong University, Xi'an 710049, China
  • Received Date: 2003-08-27
  • Accepted Date: 2004-02-04
  • Available Online: 2004-07-25

Abstract: A new high power,short duration time XeCl laser is realized in order to prepare microstructure of quantum effect,depositing film,molecular beam epitaxy and analysis of output pulse profiles. It adopts the method of glow discharged,the calculation of dynamic equation,the analysis velocity reaction and density of XeCl laser,and UV preionization. In the addition,the parameters of the laser are also measured. The results are wavelength 308nm,the pulse duration time 18ns,the pulse energy 450mJ and the beam divergence angle 3mrad. It is shown that the proposed glow discharged is realized,the dynamic equation model of laser is correct,and the laser has high efficiency to produce the vapor plasma plume.It can be applied in the interaction between laser and material,material plasma study.

    HTML

Reference (4)

Catalog

    Copyright © Laser Technology. 蜀ICP备10038222号-1

    Address：No. 7, Section 4, Renmin South Road, Chengdu, Sichuan Province, China Postal Code：610041  Telephone：028-68011091/68011046  Email： jgjs@vip.163.com,  jgjs@sina.com

    Supported by: Beijing Renhe Information Technology Co. Ltd  support: info@rhhz.net

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return