Micro-resonator fabricated by anisotropic Si etching

In this paper,a novel fabrication technique to obtain silicon crystalline flat planes is described.The selected Si crystalline planes that are not always the planes having the lowest etching rate are pre-obtained by deep-RIE.Si anisotropic wet etching generates the flat crystalline planes with EPW after the deep-RIE.The proposed technique is demonstrated by fabricating a solid polymer dye micro-cavity laser that is molded by the etched Si cavity.The lasing spectra confirm that the planes are optically smooth by measuring the sidewalls of the Si mold.