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Xu Rongqing, Lu Jian, Ni Xiaowu, Yang Kecheng, Cheng Zuhai. Effect of light field force on transportation behavior of ablated materials[J]. LASER TECHNOLOGY, 2003, 27(3): 202-204.
Citation: Xu Rongqing, Lu Jian, Ni Xiaowu, Yang Kecheng, Cheng Zuhai. Effect of light field force on transportation behavior of ablated materials[J]. LASER TECHNOLOGY, 2003, 27(3): 202-204.
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Effect of light field force on transportation behavior of ablated materials

  • 1.

    Department of Electronics and Information, East China Shipbuilding Institute, Zhenjiang, 212003;

  • 2.

    Department of Applied Physics, Nanjing University of Science & Technology, Nanjing, 210094;

  • 3.

    National Lbaoratory of Laser Technology, HUST, Wuhan, 430074

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  • Received Date: July 08, 2002
  • Revised Date: October 17, 2002
  • Published Date: May 24, 2003
    Graphical Abstract
    • Abstract
  • The transportation behavior of ablated materials is studied.The speed distribution of ablated materials when they leave target material surface is determined by the mechanism of ablation.The transportation behavior of ablated materials during the action of working laser is controlled by diffusion mechanism and light field force mechanism.The transportation behavior is determined by diffusion mechanism only after the action of laser.The time-space distribution and the tending-to-light phenomena of ablated materials are interpreted.
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    • References (13)
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