Effect of pumping parameters of electron beam on the third continuum of argon

Zhao Yongpeng; Wang Qi; Liu Jincheng

Zhao Yongpeng, Wang Qi, Liu Jincheng. Effect of pumping parameters of electron beam on the third continuum of argon[J]. LASER TECHNOLOGY, 2003, 27(2): 137-139.

Citation:

Zhao Yongpeng, Wang Qi, Liu Jincheng. Effect of pumping parameters of electron beam on the third continuum of argon[J]. LASER TECHNOLOGY, 2003, 27(2): 137-139.

Citation:

Zhao Yongpeng, Wang Qi, Liu Jincheng. Effect of pumping parameters of electron beam on the third continuum of argon[J]. LASER TECHNOLOGY, 2003, 27(2): 137-139.

Effect of pumping parameters of electron beam on the third continuum of argon

Graphical Abstract

Graphical Abstract

Abstract

Abstract

The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.