Effect of pumping parameters of electron beam on the third continuum of argon

Zhao Yongpeng; Wang Qi; Liu Jincheng

LASER TECHNOLOGY > 2003 > 27(2): 137-139.

Zhao Yongpeng, Wang Qi, Liu Jincheng. Effect of pumping parameters of electron beam on the third continuum of argon[J]. LASER TECHNOLOGY, 2003, 27(2): 137-139.

Citation:

Zhao Yongpeng, Wang Qi, Liu Jincheng. Effect of pumping parameters of electron beam on the third continuum of argon[J]. LASER TECHNOLOGY, 2003, 27(2): 137-139.

Citation:

Zhao Yongpeng, Wang Qi, Liu Jincheng. Effect of pumping parameters of electron beam on the third continuum of argon[J]. LASER TECHNOLOGY, 2003, 27(2): 137-139.

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Effect of pumping parameters of electron beam on the third continuum of argon

National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology, Harbin, 150001

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Received Date: February 04, 2002
Revised Date: April 04, 2002
Published Date: March 24, 2003

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Abstract

Abstract

The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.
- electron beam,
- diode,
- the third continuum

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Effect of pumping parameters of electron beam on the third continuum of argon

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