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Volume 27 Issue 2
Sep.  2013
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Effect of pumping parameters of electron beam on the third continuum of argon

  • Received Date: 2002-02-05
    Accepted Date: 2002-04-05
  • The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.
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    沈阳化工大学材料科学与工程学院 沈阳 110142

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Effect of pumping parameters of electron beam on the third continuum of argon

  • 1. National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology, Harbin, 150001

Abstract: The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.

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