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Du Jinglen, Zeng Yangsu, Huang Xiaoyang, Su Jingqin, Guo Yongkang, Cui Zeng. Effect of distortion of mask on photolithography pattern quality[J]. LASER TECHNOLOGY, 2002, 26(1): 20-22.
Citation: Du Jinglen, Zeng Yangsu, Huang Xiaoyang, Su Jingqin, Guo Yongkang, Cui Zeng. Effect of distortion of mask on photolithography pattern quality[J]. LASER TECHNOLOGY, 2002, 26(1): 20-22.
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Effect of distortion of mask on photolithography pattern quality

  • 1.

    Department of Physics, Sichuan University, Chengdu, 610064;

  • 2.

    Central Microstructure Facility, Rutherford Appleton Laboratory, Chilton, Didcot, OXON, OX11 0QX, U. K.

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  • Received Date: September 21, 2000
  • Published Date: January 24, 2002
    Graphical Abstract
    • Abstract
  • Following the difference of double Gaussian function describing the proximity effects in laser direct writing,the distortion of the mask and its influence on projection lithography pattern quality are simulated.The results show that the area deviation of the mask fabricated by laser writer is about 5% and make the projection lithography quality worse.
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    • References (5)
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