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Volume 25 Issue 5
Sep.  2013
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Article Navigation >  LASER TECHNOLOGY  > 2001 >  25(5): 386-390

Citation:
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A method to improve the precision of turning point monitoring approach

  • 1.

    National Laboratory of Laser Technology, HUST, Wuhan, 430074

  • Received Date: 2000-05-31
    Accepted Date: 2000-12-28
  • A monitoring method, which can improve the precision of the turning point monitoring approach,is proposed in the paper. This method stops depositing each layer of a film at the point which has different reflectance extreme overshoot so that the structure of the deposited film is similar to the design. It can improve the monitoring precision of a coating with quarterwave or non-quarterwave optical thickness layers.
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  • [1] 周九林.光学薄膜技术.北京:国防工业出版社,1974:186
    [2]

    Macleod H A.Appl Opt,1981;20:82
    [3] 张晓晖.光纤通信用光学薄膜器件的研制.华中科技大学博士学位论文,2000
    [4]

    Macleod H A.Thin-Film Optical Filters. London:Adam Hilger Ltd,1969:395
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  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

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A method to improve the precision of turning point monitoring approach

  • 1. National Laboratory of Laser Technology, HUST, Wuhan, 430074
  • Received Date: 2000-05-31
  • Accepted Date: 2000-12-28
  • Available Online: 2001-09-25

Abstract: A monitoring method, which can improve the precision of the turning point monitoring approach,is proposed in the paper. This method stops depositing each layer of a film at the point which has different reflectance extreme overshoot so that the structure of the deposited film is similar to the design. It can improve the monitoring precision of a coating with quarterwave or non-quarterwave optical thickness layers.

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