A method to improve the precision of turning point monitoring approach
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Graphical Abstract
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Abstract
A monitoring method, which can improve the precision of the turning point monitoring approach,is proposed in the paper. This method stops depositing each layer of a film at the point which has different reflectance extreme overshoot so that the structure of the deposited film is similar to the design. It can improve the monitoring precision of a coating with quarterwave or non-quarterwave optical thickness layers.
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