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Volume 24 Issue 4
Sep.  2013
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Article Navigation >  LASER TECHNOLOGY  > 2000 >  24(4): 213-217

Citation:
shu

Bright and dark figure method for OPC and its experimental research

  • 1.

    Department of Physics, Sichuan University, Chengdu, 610064;

  • 2.

    Central Microstructure Facility, Rutherford Appleton Laboratory, Chilton, Didcot, OX11 0QX, U K

  • Received Date: 1999-08-26
  • Optical proximity correction is an effective and essential tool in submicron photolithography.In this paper,based on the theory of wavefront engineering,we presente a new correction method to reduce proximity effects by adding bright and dark figure or feature on the mask and analyzing the mechanism for correcting proximity effect.Some 0.5μm features have been got by using the new correction method in a I line projection system which can only fabricate 0.7μm figure without OPC.The satisfied experiment results are obtained and the advantages or disadvantages are discussed by using different OPC method.
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  • [1] 杜惊雷,黄奇忠,郭永康et al.光学学报,1999;19(5):698～702
    [2]

    Du J L,Huang Q Z,Su J Q et al.Microelectronic Engineering,1999;46:73～76
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    Mack C A,Kaufman P M.J Vacuum Sci&Technol,1988;B6(6):2213～2206
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    Starikov A.SPIE,1988;1088:34～46
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    Garofalo J,Otto O,Cirelli R et al.SPIE,1995;2440:302～312
    [6]

    Chen J F,Laidig T,Wampler K E et al.SPIE,1997;3051:790～803
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通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

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Bright and dark figure method for OPC and its experimental research

  • 1. Department of Physics, Sichuan University, Chengdu, 610064;
  • 2. Central Microstructure Facility, Rutherford Appleton Laboratory, Chilton, Didcot, OX11 0QX, U K
  • Received Date: 1999-08-26
  • Available Online: 2000-07-25

Abstract: Optical proximity correction is an effective and essential tool in submicron photolithography.In this paper,based on the theory of wavefront engineering,we presente a new correction method to reduce proximity effects by adding bright and dark figure or feature on the mask and analyzing the mechanism for correcting proximity effect.Some 0.5μm features have been got by using the new correction method in a I line projection system which can only fabricate 0.7μm figure without OPC.The satisfied experiment results are obtained and the advantages or disadvantages are discussed by using different OPC method.

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