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Volume 22 Issue 2
Sep.  2013
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The investigation of the dynamic process on thermal distortion of silicon mirror

  • 1.

    National Laboratory of Laser Technology, HUST, Wuhan, 430074

  • Used optical interferometry,the dynamic process of thermal distortion of the silicon mirror was investigated experimentally,while the 2kW CO2 laser beam is used as incident source.The diplacement of surface of the silicon mirror is varying raplidly in the beginning of the distortion.For a silicon mirror,that is 70mm in diameter and 8mm in thickness,the maximum deflection introduced by thermal distortion is 0.76μm,when the absorbed laser power is 140W and the acting time is 4s.It is not an negligible problem to a high power short wavelength laser.
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  • [1]

    Herrit G L,Reedy H E.SPIE,1989;1047:33
    [2]

    Zhang Y N,Cheng Z H,Ku G et al.SPIE,1996;2889:253
    [3] 夏金安,程祖海,丘军林.激光技术,1996;20(6):380
    [4]

    Parkus H.T hermoelasticity,2nd edition.Springer-Verlag,Wien,1976:46~49
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    沈阳化工大学材料科学与工程学院 沈阳 110142

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The investigation of the dynamic process on thermal distortion of silicon mirror

  • 1. National Laboratory of Laser Technology, HUST, Wuhan, 430074
  • Available Online: 1998-03-25

Abstract: Used optical interferometry,the dynamic process of thermal distortion of the silicon mirror was investigated experimentally,while the 2kW CO2 laser beam is used as incident source.The diplacement of surface of the silicon mirror is varying raplidly in the beginning of the distortion.For a silicon mirror,that is 70mm in diameter and 8mm in thickness,the maximum deflection introduced by thermal distortion is 0.76μm,when the absorbed laser power is 140W and the acting time is 4s.It is not an negligible problem to a high power short wavelength laser.

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