Rapid developing LCVD technology

In This paper,the development process and the application of LCVD technology in growing the metal film,dielectric film and semiconductor film in during the past ten years are reviewed.With this technology,not only the conventional de-vices can get the excellent electronic features because of low growth temperature,but also the new structure materials and new devices can be manufactured for using the high accurate thickness control.The wide application prospect of LCVD technology is described here.