A new method of monitoring the in-situ residual reflectivity of antireflection coating
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Received Date:
1991-08-13
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Abstract
A new method of monitoring the in-situ extremely low residual reflectivity of antireflection (AR) coating of travelling-wave semiconductor laser amplifier (TW-SLA) is presented. The relations among the residual reflectivity, temperature and the output power of SLA are analyzed theoretically and experimentally. Minimum reflectivity less than 5×10-4 can be realized by means of using a 1.3μm InGaAsP/InP buried-hetero-structure (BH) laser diode coated with single-layer SiOx or double-lager SiOx1/SiOx2 film.
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Proportional views
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