Recent progress of novel photolithography technologies

HE Liwen; LUO Le; MENG Gang; SHAO Jingzhen; FANG Xiaodong

doi:10.7510/jgjs.issn.1001-3806.2019.01.007

LASER TECHNOLOGY > 2019 > 43(1): 30-37. > DOI: 10.7510/jgjs.issn.1001-3806.2019.01.007

HE Liwen, LUO Le, MENG Gang, SHAO Jingzhen, FANG Xiaodong. Recent progress of novel photolithography technologies[J]. LASER TECHNOLOGY, 2019, 43(1): 30-37. DOI: 10.7510/jgjs.issn.1001-3806.2019.01.007

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Recent progress of novel photolithography technologies

1.
School of Electronics and Applied Physics, Hefei University of Technology, Hefei 230009, China
2.
Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China

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Received Date: January 17, 2018
Revised Date: March 05, 2018
Published Date: January 24, 2019

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Abstract

Abstract

Integrated circuit(IC) lithography, as a typical representative of traditional lithography technology, supports the rapid development of integrated circuit chips. The new generation of photolithography technology has the advantages of diverse technology, high precision and high efficiency. It has great potential in the development of optoelectronic devices, the realization of 3-D micro-nano structure, and the construction of the ordered nanoscale channels. A variety of new photolithography technologies in recent years have been reviewed. Their characteristics and their applications in nanoelectronics, photonic devices, energy, sensing and other fields have been analyzed. Finally, the development direction of lithography technology in the future is prospected.
- laser technique,
- optical fabrication,
- new lithography technology,
- maskless lithography,
- mask lithography,
- micro-nano structure

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References (44)

References

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