ArF excimer laser induced damage on high reflective fluoride film

In order to study the damage mechanism of high reflective fluoride film under a certain condition, the damaged areas of the films made with the different processing techniques were analyzed by means of differential interference contrast microscopy, atomic force microscopy and optical profiler. With the increase of the film deposition temperature and the packing density of the film in vivo, laser induced damage threshold of film is improved. For the regular film series, a standing wave electric field intensity distribution of the standing wave in vivo has the greater impact on the film damage. The results show that the damage of high-reflection film is jointly caused by packing density of the film in vivo and electric field intensity distribution based on the damage morphology and damage depth of the film. The results provide the foundation for further research of high quality of laser reflective coatings.