Accumulation effect of film damage under repetitive laser pulses

FAN Weixing; WANG Pingqiu; HAN Jinghua; LIU Quanxi; YANG Jie; GUO Chao

doi:10.7510/jgjs.issn.1001-3806.2014.02.014

LASER TECHNOLOGY > 2014 > 38(2): 210-213. > DOI: 10.7510/jgjs.issn.1001-3806.2014.02.014

FAN Weixing, WANG Pingqiu, HAN Jinghua, LIU Quanxi, YANG Jie, GUO Chao. Accumulation effect of film damage under repetitive laser pulses[J]. LASER TECHNOLOGY, 2014, 38(2): 210-213. DOI: 10.7510/jgjs.issn.1001-3806.2014.02.014

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Accumulation effect of film damage under repetitive laser pulses

1.
School of Electronics and Information Engineering, Sichuan University, Chengdu 610064, China;
2.
Southwest Institute of Technical Physics, Chengdu 610041, China

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Received Date: May 07, 2013
Revised Date: June 05, 2013
Published Date: February 24, 2014

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Abstract

In order to study the accumulation effect of film damage under repetitive laser pulses, experimental observations and thermodynamic analysis were carried out. The morphologies damaged by single and multiple laser pulses were observed under a 5000× microscope, then the thermodynamic process between the interaction of laser and plasma was analyzed. Finally the evolution rule of the film damage was found. Both of these two damaged morphologies can be explained by the thermodynamic interactions between laser and laser plasmas. The research results show that: the rough surface of thin film is induced by the laser pulses, which will absorb more laser energy than the beginning. The melt will be removed by the stronger ablation and will be accumulated outside of the laser working area. Since the laser energy is Gaussian distributed, the damaged of multiple laser pulses is centralized and the ablation is limited at the center of laser beam only. This result is a preference for study about film ablation under repetitive laser pulses.
- laser technique,
- repetitive laser pulse,
- thin film damage,
- Gaussian beam,
- X-ray diffraction spectra

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