Effect of relative position error in microlens arrays pair on beam homogenization

In order to obtain a working beam profile with high uniformity by microlens arrays pair in laser annealing equipment the elfect of relative position error of arrays pair was investigated.The dependence of the beam uniformity on the sixdegrees of freedom between two arrays was simulated with ray tracing method.It is found that the beam homogenization is most sensitive to roll angle error of the second array and precise control of relative position of two arrays is needed.The experimentresults indicate that with the aid of special lens mounts,the relative position of two arrays.an he controlled precisely and a flattop beam profile with beam uniformity of 0.039 is obtained as well.The laser annealing experiment for ultra shallow junction formation is demonstrated by this homogeneous beam successfully.