Effect of atomic velocity at substrate diffraction on laser-focused Cr atom deposition
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1.
College of Metrology & Measurement Engineering, China Jiliang University, Hangzhou 310018, China;
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2.
College of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004, China
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Received Date:
2012-12-01
Accepted Date:
2013-01-05
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Abstract
In order to study the effect of substrate diffraction on laser-focused Cr atom deposition, simulation and comparative analysis were performed based on the scalar optical diffraction theory under the presence and absence of substrate diffraction. The variation of stripe value of atomic wave-packet probability distribution which stands for the deposited lines with different atomic wave-packet velocities was focused. The results show that because of substrate diffraction, the max value of wave-packet probability distribution has 14.9% average increase and the full width of half maximum (FWHM) has 14.3% average decrease for different longitudinal most probable velocities when transverse velocity remains constant; the max value of wave-packet probability distribution has 14.5% average increase and the FWHM has 16.9% average decrease for different transverse velocities when the most probable longitudinal velocity remains constant. The research results provide a richer theoretical guidance for the experiment.
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References
[1]
|
LI T B. Nanometrology and transfer standard[J]. Shanghai Measurement and Testing,2005,32(1): 8-13(in Chinese). |
[2]
|
McCLELLAND J J,ANDERSON W R,BRADLEY C C,et al. Accuracy of nanoscale pith standards fabribcated by laser-focused atomic deposition[J]. Journal of Research of the National Institute of Standards and Technology,2003,108(2):99-113. |
[3]
|
McCLELLAND J J. Atom-optical properties of a standing-wave light field[J]. Journal of the Optical Society of America,1995,B12(10): 1761-1767. |
[4]
|
KIDAN T,ADLER J,RON A. Numerical simulations of an atomic beam focused by an optical potential[J]. Computers in Physics,1998,12(5):471-477. |
[5]
|
ZHANG W T,ZHU B H,XIONG X M,et al. Characteristics of deposition for neutral atoms in laser standing wave with different velocities[J]. Acta Physica Sinica,2011,60(6):063202(in Chinese). |
[6]
|
ZHANG P P,MA Y,LI T B. Optimization of particle optics model for one-dimensional atom lithography[J]. Acta Optica Sinica,2011,31(5): 0514004 (in Chinese). |
[7]
|
ZHANG B W,MA Y,ZHAO M,et al.3-D simulation of nano-grating by Cr atom beam deposition[J].Laser Technology,2011,35(3): 364-367 (in Chinese). |
[8]
|
ZHANG W T,ZHU B H,HUANG J,et al. Chromium atom deposition in elliptical standing wave field[J]. Acta Physica Sinica,2011,60(10): 103203(in Chinese). |
[9]
|
ZHANG B W,MA Y,ZHANG P P,et al.Simulations of Gaussian laser standing wave based on diffraction by straight edge[J]. Laser Technology,2012,36(6): 810-813(in Chinese). |
[10]
|
ZHANG B W,ZHI L X,ZHANG W T.Simulations of optical potential formed resulted from Gaussian laser standing wave based on diffraction by straight edge[J]. Acta Physica Sinica,2012,61(18): 183201(in Chinese). |
[11]
|
ANDERSON W R,BRADLEY C C,McCLELLAND J J,et al. Minimizing feature width in atom optically fabricated chromium nanostructures[J]. Physical Review,1999,A59(3): 2476. |
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Proportional views
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