Effect of atomic velocity at substrate diffraction on laser-focused Cr atom deposition

ZHANG Bao-wu; ZHI Li-xiang; ZHANG Wen-tao; JIA Meng-xiang

doi:10.7510/jgjs.issn.1001-3806.2013.04.002

LASER TECHNOLOGY > 2013 > 37(4): 421-424. > DOI: 10.7510/jgjs.issn.1001-3806.2013.04.002

ZHANG Bao-wu, ZHI Li-xiang, ZHANG Wen-tao, JIA Meng-xiang. Effect of atomic velocity at substrate diffraction on laser-focused Cr atom deposition[J]. LASER TECHNOLOGY, 2013, 37(4): 421-424. DOI: 10.7510/jgjs.issn.1001-3806.2013.04.002

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Effect of atomic velocity at substrate diffraction on laser-focused Cr atom deposition

1.
College of Metrology & Measurement Engineering, China Jiliang University, Hangzhou 310018, China;
2.
College of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004, China

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Received Date: November 30, 2012
Revised Date: January 04, 2013
Published Date: July 24, 2013

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Abstract

In order to study the effect of substrate diffraction on laser-focused Cr atom deposition, simulation and comparative analysis were performed based on the scalar optical diffraction theory under the presence and absence of substrate diffraction. The variation of stripe value of atomic wave-packet probability distribution which stands for the deposited lines with different atomic wave-packet velocities was focused. The results show that because of substrate diffraction, the max value of wave-packet probability distribution has 14.9% average increase and the full width of half maximum (FWHM) has 14.3% average decrease for different longitudinal most probable velocities when transverse velocity remains constant; the max value of wave-packet probability distribution has 14.5% average increase and the FWHM has 16.9% average decrease for different transverse velocities when the most probable longitudinal velocity remains constant. The research results provide a richer theoretical guidance for the experiment.
- laser technique,
- substrate diffraction,
- atomic wave-packet,
- optical potential

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