高级检索

多孔硅异质结电致发光器件发光特性研究

杨亚军, 李清山, 刘宪云

杨亚军, 李清山, 刘宪云. 多孔硅异质结电致发光器件发光特性研究[J]. 激光技术, 2007, 31(2): 166-168.
引用本文: 杨亚军, 李清山, 刘宪云. 多孔硅异质结电致发光器件发光特性研究[J]. 激光技术, 2007, 31(2): 166-168.
YANG Ya-jun, LI Qing-shan, LIU Xian-yun. Study on properties of electroluminescence from porous silicon heterojunction device[J]. LASER TECHNOLOGY, 2007, 31(2): 166-168.
Citation: YANG Ya-jun, LI Qing-shan, LIU Xian-yun. Study on properties of electroluminescence from porous silicon heterojunction device[J]. LASER TECHNOLOGY, 2007, 31(2): 166-168.

多孔硅异质结电致发光器件发光特性研究

基金项目: 

山东省自然科学基金资助项目(Y2002A09)

详细信息
    作者简介:

    杨亚军(1976- ),男,硕士研究生,主要从事发光材料光谱研究.

    通讯作者:

    李清山,E-mail:qsl@imail.qfnu.edu.cn

  • 中图分类号: O472

Study on properties of electroluminescence from porous silicon heterojunction device

  • 摘要: 多孔硅电致发光性质的研究对于实现硅基光电集成具有重要的应用价值。采用蒸镀-阳极氧化法制备了多孔硅异质结(ITO/PS/p-Si/Al)电致发光器件,在7.5V较低电压下实现了数小时连续电致发光,并给出了该器件的发光和电学性能的测量结果。结果表明,要制备较好发光性能和伏安特性的多孔硅电致发光器件,顶部电极应同时具有较高的透光率和电导率。
    Abstract: Study on electroluminescence from porous silicon(PS) has important application value in silicon-based photoelectron integration.Electrically induced visible light-emitting PS device with structure of ITO/PS/p-Si/Al were fabricated by means of evaporation-anodic oxidation method.The light emission of the device lasted for a few hours under 7.5V forward bias conditions.Luminescent and electronic properties were investigated.Results suggest that ITO thin films should have both high electrical conductivity and optical transmittance in order to achieve light-emitting PS device with fine luminescent and current-voltage properties.
  • [1]

    CANHAM L T.Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers[J].A P L,1990,57(10):1046~1048.

    [2]

    KOSHIDA N,KOYAMA H.Visible electroluminescence from porous silicon[J].A P L,1992,60(3):347~349.

    [3]

    SHI H,ZHENG Y,WANG Y et al.Electrically induced light emission and novel photocurrent response of a porous silicon device[J].A P L,1993,63(6):770~772.

    [4]

    KUZNETSOV V A,ANDRIENKO I,HANEMAN D.High efficiency blue-green electroluminescence and scanning tunneling microscopy studies of porous silicon[J].A P L,1998,72(25):3323~3325.

    [5]

    TSUYOSHI O,HIDEKI K,TSUYOSHI O et al.Mechanism of the visible electroluminescence from metal/porous silicon/n-Si devices[J].J A P,1997,81(3):1407~1412.

    [6]

    NOBUYOSHI K,HIDEKI K,YUKO Y.Visible electroluminescence from porous silicon diodes with an electropolymerized contace[J].A P L,1993,63(19):2655~2657.

    [7]

    FEREYDOON N,MARUSKA H P,KALKHORAN N M.Visible electroluminescence from porous silicon np heterojunction diodes[J].A P L,1992,60(20):2514~2516.

    [8]

    LINNROS J,LALIC N.High quantum efficiency for a porous silicon light emitting diode under pulsed operation[J].A P L,1995,66(22):3048~3050.

    [9]

    NISHIMURA K,NAGAO Y,IKEDA N.High external quantum efficiency of electroluminescence from photoanodized porous silicon[J].Japan J A P,1998,37(3):303~305.

    [10]

    STEINR P,KOZLOWSKI F,LANG W.Light-emitting porous silicon diode with increased electroluminescence quantum efficiency[J].A P L,1993,62(21):2700~2702.

    [11]

    BARILLARO G,DILIGENT A,PIERI F.Integrated porous-silicon light-emitting diodes:a fabrication process using graded doping profiles[J].A P L,2001,78(26):4154~4156.

    [12]

    AO Y H,HU Sh L,LONG H et al.Study on pulsed lair deposition technology[J].Laser Technology,2003,27(5):453~459(in Chinese).

    [13]

    CHEN Ch Zh,BAO Q H,YAO Sh Sh et al.Pulsed lair deposition and its application[J].Laser Technology,2003,27(5):446~446(in Chinese).

    [14]

    KIM H,HORWTTZ J S,PIQUE A et al.Electrical and optical properties of indium tin oxide thin films grown by pulsed laser deposition[J].Appl Phys,1999,A69(S1):447~450.

计量
  • 文章访问数:  1
  • HTML全文浏览量:  0
  • PDF下载量:  5
  • 被引次数: 0
出版历程
  • 收稿日期:  2006-02-19
  • 修回日期:  2006-03-23
  • 发布日期:  2007-04-24

目录

    /

    返回文章
    返回