Improvement of antireflection coating on KTP crystal
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摘要: 为了改进KTP晶体倍频增透膜的镀膜质量,采用SiO2代替原来使用的MgF2材料作外层膜并重新设计了膜系。实验结果表明,运用上述技术将镀有1064nm和532nm增透膜的KTP倍频晶体应用在高功率Nd:YAG激光器中,当重复频率lkHz、脉宽25ns、基波功率密度高达450MW/cm2时,没有观察到KTP晶体表面激光损伤,膜层表面抗激光损伤和光学性能都得到提高。Abstract: By redesigning the film with substituting SiO2 instead of MgF2 as the outer layer film,the frequency doubling anti-reflection coating on the KTP crystal is improved.After the KTP crystal with 1064nm and 532nm antireflection coating is applied in high power Q-switched Nd:YAG laser,any surface damage have not been observed even at intensity as high as 450MW/cm2 at a pulse repetition rate of 1kHz and 25ns of pulse duration.The experimental results show that both the surface quality and the optical property of the film have been improved.
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Keywords:
- thin film /
- antireflection coating /
- KTP crystal /
- laser-induced damage threshold
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