Effect of phase changes of interference fringes on exposure of plane holographic gratings
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摘要: 为更好地评价平面全息光栅曝光系统的性能,了解干涉条纹相位变化对光栅制作的影响,基于曝光量表达式,结合光栅掩模槽形二元模型,采用理论分析和数值计算的方法,分析了条纹相位变化对曝光对比度、光栅掩模槽形和曝光量相位的影响。各种形式的干涉条纹低频漂移均会降低曝光对比度,导致掩模槽形的可控性下降,其影响具有一致性;为保证曝光对比度达到0.95,低频漂移均方根值应控制在0.05个条纹周期以内;小幅值高频振动对光栅曝光的影响可以忽略;低频漂移造成的曝光量相位误差不影响光栅的衍射特性。结果表明,为获取合格的光栅掩模,应控制光刻胶非线性和曝光量的匹配关系,并将干涉条纹低频漂移均方根值控制在1/20条纹周期以内。可将其作为评价全息光栅曝光系统稳定性的重要指标。Abstract: In order to evaluate the performance of plane holographic grating exposure system and study the influence of interference fringe's phase changes on grating manufacture, based on exposure dose expression and binary model of grating mask profile, the effect of fringe's phase vibration on exposure contrast, grating mask profile and exposure phase were analyzed by theoretical analysis and numerical calculation. The results show that all kinds of interference fringe low-frequency drift decrease exposure contrast and the controllability of grating mask profile is reduced. The influence has consistency. For keeping the exposure contrast greater than 0.95, root mean square(RMS) value of low-frequency drift needs to be controlled in the range of 0.05 fringe's period. The effect of small amplitude high frequency vibration on grating exposure can be neglected. Exposure phase error caused by low-frequency shift doesn't impact diffractive characteristic of grating. For getting qualified grating mask, the matching relationship between photoresist nonlinearity and exposure should be controlled and RMS of low frequency drift should be smaller than 1/20 fringe's period which can be used to evaluate the stability of holographic grating exposure system.
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