Abstract: The experiments of marking to enamelware with 308nm excimer laser are finished. A fine and visible pattern can be acquired when the enamelware sample is irradiated by one or several 308nm excimer laser pulses if their fluences are over the marking threshold. The marking fluence threshold is far lower than that based on the vaporizing and etching principle. The marking mechanism is studied in this paper and the conditions of marking are optimized in experiments.