Study on deposition mode and rate in pulsed laser deposition of Al film
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摘要: 为了给脉冲激光沉积(PLD)法沉积大面积均匀薄膜的应用提供相关的理论依据,以纯铝块作为靶材,采用PLD法在同轴和旁轴两种模式下对比研究了Al薄膜的厚度均匀性。同时,在旁轴的沉积模式下分别研究了基片温度、激光功率和重复频率对A l薄膜沉积速率的影响规律。实验结果表明,采用PLD方法在旁轴的沉积模式下获得的Al薄膜的厚度更加均匀。随着基片温度的增加,薄膜的沉积速率反而降低。升高激光功率,薄膜的沉积速率也随之提高。而在激光重复频率的变化过程中,Al薄膜的沉积速率有一最大值。Abstract: Bulk aluminium material is chosen as targets to prepare pure Al film by the method of pulsed laser deposition(PLD).The thickness uniformity of Al film in coaxial and side-axial deposition modes is also studied comparatively.Besides,the effects of substrate temperature,laser power and repetition rate on deposition rate of Al film in side-axial deposition mode are investigated respectively.The results show that the thickness uniformity of the film gotten in side-axial deposition mode is better than that in coaxial deposition mode.The deposition rate of Al film decreases with the increase of the substrate temperature.However,the deposition rate of Al film increases with increasing laser power.Especially,there is a maximum deposition rate of Al film by varying the laser repetition rate.The above method and results can be used as a theoretical guidance for big area film deposition by PLD in application.
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Keywords:
- thin films /
- pulsed laser deposition /
- deposition mode /
- thickness uniformity /
- deposition rate
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