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Nd:YAG激光器切割硅薄膜太阳能电池的工艺参数研究

刘源, 李正佳, 吴奇彬

刘源, 李正佳, 吴奇彬. Nd:YAG激光器切割硅薄膜太阳能电池的工艺参数研究[J]. 激光技术, 2006, 30(3): 248-251.
引用本文: 刘源, 李正佳, 吴奇彬. Nd:YAG激光器切割硅薄膜太阳能电池的工艺参数研究[J]. 激光技术, 2006, 30(3): 248-251.
LIU Yuan, LI Zheng-jia, WU Qi-bin. Research of technical parameters of Nd∶YAG laser scribing silicon film solar cell[J]. LASER TECHNOLOGY, 2006, 30(3): 248-251.
Citation: LIU Yuan, LI Zheng-jia, WU Qi-bin. Research of technical parameters of Nd∶YAG laser scribing silicon film solar cell[J]. LASER TECHNOLOGY, 2006, 30(3): 248-251.

Nd:YAG激光器切割硅薄膜太阳能电池的工艺参数研究

详细信息
    作者简介:

    刘源(1979- ),女,硕士研究生,现从事激光与物质相互作用的研究.

    通讯作者:

    李正佳,E-mail:zhjli@mail.hust.edu.cn

  • 中图分类号: TG485

Research of technical parameters of Nd∶YAG laser scribing silicon film solar cell

  • 摘要: 结合国内外激光薄膜加工研究结果,从激光与物质相互作用的角度出发,建立激光切割硅薄膜太阳能电池的柱面坐标理论模型。利用Monte Carlo法求得多层薄膜结构的光场分布,进一步用有限元法(fin ite elem entm ethod,FEM)求得柱面坐标下热平衡方程的数值解。得出了能量密度、脉冲形状、重复频率、光斑形状与切割速度以及切割质量之间的关系。
    Abstract: An optical-thermal model in cylindrical coordinate of pulsed laser scribing multi-layer thin film solar cell module is established.Monte Carlo method is employed to obtain the light fluencies rate of multi-layer material.Finite element method(FEM) is used to solve the heat equation in cylindrical coordinate.And the connection of the laser energy density,repeatition frequency,the shape of pulse and facula,scribing rate and scribing quality is obtained.
  • [1]

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    [1]

    COMPAAN A D,MATULIONIS I,MILLER M et al.Optimization of laser scribing for thin-film photovolaics[A].Photovoltaic Specialists Conference,1996,Conference Record of the Twenty-Fifth IEEE[C].Washington DC:IEEE Press,1996.769~772.

    [2]

    QI J,WANG K L,LIANG M Ch et al.Study on laser scribing of silicon wafer with a Q-switched Nd∶ YAG laser[J].Journal of Materials Engineering,1999,44(3):45~48(in Chinese).

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    GRIGOROPOULOS C P,PARK H K,XU X et al.Modeling of pulsed laser irradiation of thin silicon layers[J].International Journal of Heat and Mass Transfer,1993,36(4):919~924.

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    KIYAMA S,HIRONO Y,HOSOKAWA H et al.Temperature distribution analysis in multi-layer thin film structure by laser beam irradiation[J].Japan Society of Precision Engineering,1990,56(6):1500~1506.

    [7]

    ONG C K,TAN H S,SIN E H et al.Calculation of melting threshold of crystalline and amorphous materials due to pulsed-laser irradiation[J].Material Science & Engineering,1986,79(3):79~85.

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出版历程
  • 收稿日期:  2005-03-06
  • 修回日期:  2005-04-07
  • 发布日期:  2006-05-24

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