激光等离子体和气体放电EUV光刻光源

Extreme ultraviolet source of microlithography based on laser induced plasma and discharge induced plasma

摘要: 对激光等离子体和气体放电两种EUV光刻光源的发展状况进行了详细介绍,分析了各种激光条件和放电方式的特点及所面临的主要问题,对各种方案的特点、技术参数进行了对比。气体放电装置较高能激光装置结构简单、价格低,故气体放电EUV光源日益受到重视。

Abstract: The present status of extreme ultraviolet(EUV) source based on laser induced plasma(LIP) and discharge induced plasma(DIP) is reviewed.The characteristics and the progresses of LIP and DIP are compared.In general, discharge induced pinch plasma is of special interest,for its cost is expected to be much lower than that of LIP.