Pulsed laser deposition and its application
-
摘要: 薄膜材料已在微电子元件、超导材料、生物材料等方面得到广泛应用,为了得到高质量的薄膜材料,脉冲激光沉积技术受到了广泛的关注。介绍了脉冲激光沉积技术的原理、特点,综述了其在制备半导体、高温超导、类金刚石、铁电、生物陶瓷薄膜等方面的应用和研究现状,展望了该项技术的应用前景。Abstract: Thin film materials have been widely used in micro electronics,superconductor,and bioceramics materials. In order to obtain high quality thin films,deposition have attracted more attention. In this paper the principle,the characteristics of the pulsed laser deposition technique are introduced. Its applications in semiconductor,high temperature superconductor,diamondlike,ferroelectric and bioceramics thin films and its current research status are reviewed. The future application trend is prospected.
-
Keywords:
- pulsed laser deposition /
- thin film /
- application /
- current research status
-
-
[1] Dijkkamp D,Venkatesan T,Wu X D.A P L,1987,51(8):619～621.
[2] Xu N,Majidi V.Appl Spectros,1993,47(8):1134～1139.
[3] 李美亚,王忠烈,林揆训 et al.功能材料,1998,29(2):132～135. [4] Numikko A,Gunshor R L.Sci Technol,1997,12:1337～1340.
[5] Zhang B,Yasuda T,Segawa Y.J Crystal Growth,1997,178:252～254.
[6] 许宁,李富铭.中国激光,2001,A28(7):661～663. [7] Strite S,Morkoc H.Sci Technol,1992,B10(4):1237～1266.
[8] 凌浩,施维,孙剑 et al.中国激光,2001,A28(3):272～274. [9] 熊旭明,周岳亮,吕惠宾.中国科学,1997,A27(10):917～922. [10] Yang F,Narumi E,Patel S.A P L,1995,67(16):2397～2399.
[11] Knierim A,Auer R,Geerk J.A P L,1997,70(5):661～663.
[12] 王荣平,周岳亮,潘少华 et al.中国科学,2000,A30(7):626～630. [13] Taki K,Suzuki T,Enomoto Y et al.Physica,2001,C366:57～62.
[14] Berenov A,Purnell A,Zhukov A et al.Physica,2002,C372～376:683～686.
[15] Jayatissa A H,Sato F,Saito N et al.Carbon,2000,38:1145～1151.
[16] Bonello M,Casiraghi C,Miotello A et al.Surface and Coatings Technology,2002,151～152:303～307.
[17] Wei Q,Sankar J,Narayan J.Surface and Coatings Technology 2001,146～147:250～257.
[18] Reisse G,Keiper B,Weissmantel W et al.Applied Surfaced Science,1998,127～129:500～506.
[19] 王华.桂林电子工业学院学报,2001,21(2):47～51. [20] 罗皓,郑学军,周益春.中国激光,2001,28(6):570～572. [21] Yang G,Gu H S,Zhu J et al.J Crystal Growth,2002,242:172～176.
[22] Noda M,Nakaiso T,Takarabe K et al.J Crystal Growth,2002,237～239:478～481.
[23] Kakuno K,Ito D,Fujimura N et al.J Crystal Growth,2002,237～239:487～491.
[24] 王启明,杜宝勋.激光与红外,2000,19(1):1～4. [25] Balestrino G,Martellucci S,Medaglia P G et al.Physica,1998,C302:78～86.
[26] Christen H M,Silliman S D,Harshavardhan K S.Applied Surface Science,2002,189:216～221.
[27] Mayor B,Arias J,Chiussi S et al.Thin Solid Films,1998,317:363～366.
[28] Zeng H T,William R,Lacefileld X P S.Biomaterials,2000,21:23～30.
[29] Cleries L,Martm E H nez et al.Biomaterials,2000,21:967～971.
[30] Fernandez-Pradas J M,Cleries L,Sardin G et al.Biomaterials,2002,23:1989～1994.
计量
- 文章访问数: 3
- HTML全文浏览量: 0
- PDF下载量: 15
下载: