硅各向异性腐蚀的微小谐振器的研制

详细信息

Micro-resonator fabricated by anisotropic Si etching

Institute of Micro/Nanometer Science & Technology, Shanghai Jiaotong University, Shanghai, 200030

摘要: 研究了一种利用硅微结构直接作为模具制作微小固体染料激光器谐振腔。它采用了硅的深层反应离子刻蚀技术(deepRIE)并结合硅的各向异性腐蚀技术(EPW),由于EPW对〈110〉面有仅次于〈111〉面的腐蚀速率,可制造出具有光学镜面的侧壁面的硅模具。利用此模具可制成出四角形环型PMMA固态染料微小谐振腔。利用激光染料若丹明6G掺杂的聚甲基丙烯酸甲酯(PMMA),在调QNd:YAG自倍频激光532nm泵浦下,得到590nm波长附近的激光输出。
- 微小共振器 /
- 硅各向异性腐蚀 /
- 硅模具 /
- 染料激光器
Abstract: In this paper,a novel fabrication technique to obtain silicon crystalline flat planes is described.The selected Si crystalline planes that are not always the planes having the lowest etching rate are pre-obtained by deep-RIE.Si anisotropic wet etching generates the flat crystalline planes with EPW after the deep-RIE.The proposed technique is demonstrated by fabricating a solid polymer dye micro-cavity laser that is molded by the etched Si cavity.The lasing spectra confirm that the planes are optically smooth by measuring the sidewalls of the Si mold.
- micro-cavity /
- anisotropical Si etching /
- Si mold /
- dye laser

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