电子束泵浦参数对氩第3谱带的影响

基金项目:

国家自然科学基金资助项目

详细信息

Effect of pumping parameters of electron beam on the third continuum of argon

National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology, Harbin, 150001

摘要: 对电子束装置进行了调试,使二极管的电流和电压可以在一定范围内改变。利用该电子束装置泵浦0.3MPa的氩气,获得了中心位于240nm氩的第3谱带。在二极管电流和电压两个参数中保持一个不变的情况下,改变另一个参数,观察到氩的第3谱带随二极管电压或电流的增加强度增大。
- 电子束 /
- 二极管 /
- 第3谱带
Abstract: The device of electron beam is adjusted and the voltage and current of diode can be changed in a certain range. The third continuum,which centers at 240nm,is obtained by electron beam pumping argon(0.3MPa). Among voltage and current of diode,one is kept fixed and the other is changed. The experimental results show that the intensity of the third continuum of argon increase with the voltage or current of diode.
- electron beam /
- diode /
- the third continuum

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