二元光学元件制作误差的振幅矢量分析法

基金项目:

江苏省自然科学基金

详细信息

Amplitude vector analytics of binary optical element fabrication errors

摘要: 本文用振幅矢量法分析二元光学元件的制作误差对衍射效率的影响,以四位相台阶光栅为例导出了衍射效率与对位误差、刻蚀深度误差的解析式并进行了讨论。整个处理方法对2n位相台阶的二元光学元件具有普遍意义。
- 振幅矢量法 /
- 二元光学元件 /
- 制作误差 /
- 衍射效率
Abstract: This paper analyses the fabrication errors of binary optical elements exerting an influence on diffraction efficiency through amplitude vector analytics.In terms of the four level element,the analytical formula about the diffraction efficiency,aim error and the error of etching depth is deduced and discussed.This method has the universal sense for 2n-level binary optical elements.
- amplitude vector method /
- binary optical element /
- fabrication errors /
- diffraction efficiency

[1]	Veldkamp W B.Proc SPIE,1991;1544:287~299
[2]	Salin A.Optical/Laser Microlithographyò.SPIE,1989;1088:527
[3]	Swanson G J,Veldkamp W B.Opt Engng,1989;28(6):105
[4]	Leger J R,Mohar M G,Gaylord T K.Appl Opt,1995;34(14):2399
[5]	周进,高文琦,韩良凯et al.光学学报,1995;15(12):1726
[6]	Hecth E,Zjac A.Optics.London:Addisson-Wsley Publishing Company,1974:369

1.	李瑞东，金大利，张梅东，于立苹，王建伟. 不同试验条件对非晶硒薄膜中载流子迁移率的影响. 真空. 2024(04): 17-21 . 百度学术
2.	李瑞东，刘雪凌，杨健. 8-羟基喹啉铝本征薄膜的制备与性质研究. 激光技术. 2018(01): 78-82 . 本站查看