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摘要: 为了研究Eu3+,Li+共掺杂的ZnO薄膜结构与发光性质,采用脉冲激光沉积方法在P型单晶Si(111)衬底上制备了Eu3+,Li+共掺杂的ZnO薄膜,其中,Eu3+作为发光中心,而Li+作为低价电荷的补偿离子和发光敏化剂。分别对样品进行了X射线衍射谱测试和光致发光谱分析。得出的数据中X射线衍射谱显示,Eu3+,Li+共掺杂的ZnO薄膜具有c轴择优取向,X射线衍射谱中除ZnO晶向以外没有出现其它结晶峰;Eu3+,Li+共掺杂的ZnO薄膜的光致发光谱与ZnO纯晶体薄膜的发射光谱基本相似,但是掺杂ZnO薄膜的紫外发光峰却出现红移现象,峰值位于382nm处,且发光峰也不尖锐。当以395nm的激发光照射样品时,在光致发光光谱中观察到了稀土Eu3+在594nm,613nm附近的特征发光峰。结果表明,掺杂元素Eu3+,Li+均已进入到ZnO晶格中,形成了以Eu3+为发光中心的ZnO纤锌矿结构。
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Abstract: In order to study the property of Eu3+ and Li+ co-doped ZnO thin film, it was deposited on the P-type Si (111) substrate by means of pulsed laser deposition(PLD)method with Eu3+ as luminous center and Li+ as the low charged compensated ions and the sensitizer. The photoluminescent(PL) spectra and the X-ray diffraction(XRD) spectra of the film were measured to analyze the crystal structure and photoluminescent property. Through XRD, it can be seen that the ZnO:Eu3+,Li+ film was highly c-axis oriented. In the XRD spectrum, no other crystal orientations were observed except the ZnO crystal orientation. The doping of Eu3+ into ZnO lattice introduced tensile stress, making ZnO crystal lattice spacing larger; but as the oxygen pressure increased, the crystal lattice spacing and lattice constant both had a smaller trend. The PL spectra of the Eu3+, Li+ co-doped ZnO thin film was similar with that of pure ZnO films, but the UV emission peak showed a red-shift phenomenon at about 382nm, and the emission peak was not sharp. When irradiated under the wavelength of 395nm, obvious emission at the wavelength of about 594nm,613nm from the rare-earth element of Eu3+ was observed in the photoluminescence spectra. All the results indicate that the doping elements of Eu3+ and Li+ have incorporated into the crystal lattice of ZnO, and conform the wurtzite structure with Eu3+ as its luminescent centre. -
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