Real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering using laser interferometry
- Received Date: 1990-12-29
- Accepted Date: 1991-06-03
- Available Online: 1991-11-25
Abstract: this paper presents a new method of real-time monitoring the thickness of ZnO film in isoaxis magnetron sputtering device with laser.TCJ-300 type isoaxis magnetron sputter machine is made in our institute.The experimental results show that this method has more adwantages than other methods of monitoring film thickness have.It can show the homogeneity and the thickness of the film as well as the sputtering velocity in process of sputtering.The experimental set and its operation are simple.The monitoring accuracy of the thick of film is better than 1.5%.