[1] |
LI C,ARGUMENT M,TSUI Y Y.Micromaching with femtosecond250nm laser pulses [J].Proc SPIE,2000,4087:1194~1200. |
[2] |
CHICHKOV B N,MOMMA C,NOLTE S.Femtosecond,picosecondand nonosecond laser ablation of solids [J].Appl Phys,1996,A63:109~115. |
[3] |
LIU X,DU D,MUROU G et al.Laser ablation and micromaching with ultrashort laser pulses [J].IEEE J Q E,1997,33(10):1706~1715. |
[4] |
PARSONS-KARAVASSILIS D,JONES R,COLE M J et al.Diodepumped all-solid-state ultrafast Cr:LiSGAF laser oscillator-amplifier system applied to laser ablation [J].Opt Commun,2000,175:389~396. |
[5] |
PRONKO P P,DUTTA S K,SUIER J.Maching of sub-micron holes using a femtosecond laser at 800nm [J].Opt Commun,1995,114:106~110. |
[6] |
SHAH L,TAWNY J,RICHARDONSON M et al.Photonic device fabrication in glass by use of nonlinear materials proceeding with a femtosecond laser oscillator [J].Opt Lett,2001,26:1516. |
[7] |
ZOUBIR A,SHAH L,RICHARDONSON K.Technology developments towards the practical use of femtosecond laser micro-materials proceeding [J].Proc SPIE,2002,4760:406~414. |
[8] |
SCHAFFER C B,MAZUR E,SQUIER J A et al.Micromaching and material change characterization using femtosecond laser oscillators [J].Proc SPIE,2002,4633:112~118. |
[9] |
MOMMA C,CHICHKOV B N,NOLTE S et al.Short-pulse laser ablation of solid targets [J].Opt Commun,1996,129:134~142. |
[10] |
MEUNIER M,FISETTE B,HOULE A et al.Processing of metals and semiconductors by a femtosecond laser-based microfabrication system [J].SPIE USE,2003,6:4932~4978. |
[11] |
MIYAMOTO I,LU Y F,SUGIOKA K et al.Morphological characterization of various kinds of materials in femtosecond-laser micromaching second international symposium on laser precision microfabrication [J].Proc SPIE,2002,4426:86~89. |
[12] |
BONSE J,BOUDACH S,KRUGER J et al.Femtosecond laser micromaching of technical materials [J].Proc SPIE,2000,4064:161~172. |
[13] |
BAUBEAU E,LEHARIC R,JONIN C et al.Micromaching with highrepetition femtosecond laser soursces [J].Proc SPIE,2000,4088:48~50. |