Study on pulsed laser deposition technology
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Received Date:
2003-01-20
Accepted Date:
2003-03-22
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Abstract
The processes of pulsed laser deposition(PLD) technology,one of the most attractive thin film preparation methods,are described. The properties are listed in contrast with other methods. The fundamental approaches and the latest appropriate developments in PLD with ultra-fast pulsed laser,pulsed-laser-arc,and dual-beam lasers are discussed in detail.
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Proportional views
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