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Volume 39 Issue 5
Jul.  2015
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Simulation of temperature field of graphene substrate fabricated by laser chemical vapor deposition

  • Corresponding author: ZHANG Jianhuan, aeolus@xmu.edu.cn
  • Received Date: 2014-12-01
    Accepted Date: 2014-12-24
  • In order to analyze the relationship between static and dynamic temperature field distribution of catalyst substrate and various experimental parameters in graphene fabrication with laser-induced chemical vapor deposition, the finite element model was established by using ANSYS software and 532nm laser model was loaded as the heat source. The data of temperature field distribution and the needing time for achieving reaction temperature under different parameters were obtained. The results show that under the influence of the property of substrate, laser power, the size of substrate area, the focus spot diameter and the reaction gas flow, the substrate temperature field distribution and the needing time for achieving reaction temperature are different. It can be used as the reference in high quality graphene fabrication experiment. The dynamic temperature field distribution under the conditions of continuous wave laser(wavelength of 532nm, power of 3W, focused spot diameter of 50m, movement speed of 1mm/s), nickel foil substrate, 10mL/min methane and 5mL/min hydrogen conforms to the pattern graphene growth mechanism fabricated by laser chemical vapor deposition.
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Simulation of temperature field of graphene substrate fabricated by laser chemical vapor deposition

    Corresponding author: ZHANG Jianhuan, aeolus@xmu.edu.cn
  • 1. Department of Mechanical and Electrical Engineering, School of Physics and Mechanical & Electrical Engineering, Xiamen University, Xiamen 361005, China

Abstract: In order to analyze the relationship between static and dynamic temperature field distribution of catalyst substrate and various experimental parameters in graphene fabrication with laser-induced chemical vapor deposition, the finite element model was established by using ANSYS software and 532nm laser model was loaded as the heat source. The data of temperature field distribution and the needing time for achieving reaction temperature under different parameters were obtained. The results show that under the influence of the property of substrate, laser power, the size of substrate area, the focus spot diameter and the reaction gas flow, the substrate temperature field distribution and the needing time for achieving reaction temperature are different. It can be used as the reference in high quality graphene fabrication experiment. The dynamic temperature field distribution under the conditions of continuous wave laser(wavelength of 532nm, power of 3W, focused spot diameter of 50m, movement speed of 1mm/s), nickel foil substrate, 10mL/min methane and 5mL/min hydrogen conforms to the pattern graphene growth mechanism fabricated by laser chemical vapor deposition.

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