Design of objective lens with long focus depth for digital grayscale lithography
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Corresponding author:
XU Zhong-bao, xuzhangb@163.com
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Received Date:
2012-10-25
Accepted Date:
2012-11-29
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Abstract
In order to improve focus depth of digital grayscale lithography, an optimization method of pupil coding was studied based on the stabilization of point spread function. A digital grayscale lithography system with 1m resolution, long focus depth and five-zone phase pupil filter was designed by using MAPLE and ZEMAX software. The results show that system modulation transfer function has defocus invariance. Under the premise of image resolution stability, the focus depth of the system is extended 2.5 times more than the original focus depth. And then, the system performance within the space of the entire focus depth is consistent with the system performance at the focal point. Thereby, the tolerance of lithography system is increased. The experimental result is the same as the theoretical analysis and the design is feasible.
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