Effect of annealing temperature on stress and optical properties of hafnium dioxide film

QI Rui-yun; WU Fu-quan; HAO Dian-zhong; WANG Qing; WU Wen-di

doi:10.3969/j.issn.1001-3806.2011.02.011

In order to study the effect of annealing temperature on the stress,optical constants and surface roughness of HfO2 film,the film specimen was fabricated with electron beam evaporation method,then annealed at different temperatures.The film specimen was tested with interferometer,UV-3101PC spectrophotometer,X-ray diffraction instrument and emission scanning electron microscopy.The experimental results show that the HfO2 film is amorphous under the experimental conditions.The residual stress is tensile stress,first decreases and then increases with annealing temperature,and achieve to the minimum at 300℃.The refractive index increases with annealing temperature,however the dispersion decreases with the annealing temperature.The film roughness annealing at low temperature is smaller than that at high temperature.These results can provide reference for the preparation of high-quality HfO2 films.

Effect of annealing temperature on stress and optical properties of hafnium dioxide film

Corresponding author: WU Fu-quan, fqwu@mail.qfnu.edu.cn;

1. Shandong Provincial Key Laboratory of Laser Polarization and Information Technology, Institute of Laser Research, Qufu Normal University, Qufu 273165, China

Received Date: 2010-06-18

Accepted Date: 2010-07-06

Available Online: 2011-03-25

Abstract: In order to study the effect of annealing temperature on the stress,optical constants and surface roughness of HfO2 film,the film specimen was fabricated with electron beam evaporation method,then annealed at different temperatures.The film specimen was tested with interferometer,UV-3101PC spectrophotometer,X-ray diffraction instrument and emission scanning electron microscopy.The experimental results show that the HfO2 film is amorphous under the experimental conditions.The residual stress is tensile stress,first decreases and then increases with annealing temperature,and achieve to the minimum at 300℃.The refractive index increases with annealing temperature,however the dispersion decreases with the annealing temperature.The film roughness annealing at low temperature is smaller than that at high temperature.These results can provide reference for the preparation of high-quality HfO2 films.

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Reference (14)

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Effect of annealing temperature on stress and optical properties of hafnium dioxide film

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