| [1] | NORTON M A,ADAMS J J,CARR C W,et al.Growth of laser damage in fused silica:diameter to depth ratio[J].Proceedings of SPIE,2007,6720:67200H/1-67200H/10. |
| [2] | CHEN M,XIANG X,JIANG Y,et al.Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser condition[J].High Power Laser and particle Beans,2010,22(6):1383-1387(in Chinese). |
| [3] | HOU R X.Application and development of supersonic cleaning optical elements[J].Optical Technology,1996,22(3):44-47(in Chinese). |
| [4] | CHEN S Zh.Ultrasonic cleaning technology and its development[J].Cleaning Technology,2004,2(2):7-12(in Chinese). |
| [5] | CUI Y,ZHAO Y A,HE H B,et al.Effects of ultrasonics cleaning and laser conditioning on the laser induce damage threshold of the antireflection[J].High Power Laser and Particle Beams,2006,18(10):1712-1716(in Chinese). |
| [6] | ZHANG D P,ZHANG D W,FAN Sh H,et al.Using ion post-treatment technique to improve laser-induced damage threshold of thin films[J].High Power Laser and Particle Beans,2005,17(2):213-216(in Chinese). |
| [7] | HUANG Z X,JIANG X D,REN H,et al.Study of laser conditioning influence on properities of optical films[J].High Power Laser and Particle Beans,2004,16(1):23-26(in Chinese). |
| [8] | CHEN M,YUAN X D,LÜH B,et al.Laser conditioning technology of optics[J].Optical Technique,2010,36(1):79-83(in Chinese). |
| [9] | HUANG J,LÜH B,YE L,et al.Damage threshold improvement of fused silica chip by CO2 1aser pretreatment[J].Chinese Journal of Lasers,2007,34(5):723-727(in Chinese). |
| [10] | HUANG J,ZHAO S N,WANG H J,et al.Local CO2 laser treatment for repair surface defect in fused silica[J].Chinese Journal of Lasers,2009,36(5):1282-1286(in Chinese). |
| [11] | HUANG J,LÜH B,WANG H J,et al.Research of enhancing damage-thresholds of fused silica using UV laser treatment[J].Laser Technology,2009,33(3):297-313(in Chinese). |