| [1] | Slusher R E,Pearton S J,McCall S L et al.A P L,1992,60(3):289～291. |
| [2] | Ando S,Kobayashi N,Ando H.Japan J A P,1995,34(1):L4～L6. |
| [3] | Okayasu M,Oku S,Ikeda M.IEEE Photo Technol Lett,1991,3(3):588～590. |
| [4] | Wu S L,Ho S T,Bi W G et al.Phys Rev Lett,1995,75(9):2678～2681. |
| [5] | Sasaki M,Li Y,Akatu Y et al.Japan J A P,2000,39(12B):7145～7149. |
| [6] | Seidel H,Csepregi A,Heuberger A et al.J Electrochem Soc,1990,137(12):3612～3626. |